发明名称 Multi-channel storage FET - has floating storage gate surrounded by insulator and has control and selector gates
摘要 <p>The n-channel storage field-effect transistor has a storage gate (G1) whose charge is reversed by the injection of electrons and which can be charged to a negative potential in relation to the uncharged state and can act upon the source-drain stage. A controllable control gate acts capactively on the storage gate. The storage gate and the channel (K) are influenced by the control gate (G2) which is connected to a selector gate (Ga2) which influences the furthr channel region (Ka) via a conductive junction (LV) made apart from an auxiliary regions (HS).</p>
申请公布号 DE2759040(A1) 申请公布日期 1979.07.12
申请号 DE19772759040 申请日期 1977.12.30
申请人 SIEMENS AG 发明人 ROESSLER,BERNWARD,DIPL.-ING.;HOFFMANN,KURT,DR.
分类号 H01L21/28;H01L29/78;H01L29/788;(IPC1-7):G11C11/40;H01L29/76 主分类号 H01L21/28
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