| 摘要 |
PURPOSE:To eliminate charging-up at the time of electron-beam exposure by using a photo mask blank substrate which has a support plate coated with a conductive substance and then with an insulating and shielding substance except one part. CONSTITUTION:Glass support plate 1 is coated with conductive substance 2 of chromium, etc., and then covered with insulating and shielding layer 3 of metal oxide, silicon, etc., with one part of layer 2 exposed, thereby obtaining a photo mask blank substrate. This substrate is applied with electron-beam resist 5 and after charge eliminating contact terminal 7 is made in contact with exposed part 4 of the conductive substance, the substrate is irradiated with electron beam 6. Since irradiated electrons propagates in conductive substance 2 and escape from exposed part 4 through charge eliminating contact terminal 7, the charging-up of the substrate is eliminated, so that a fine pattern can be formed. |
