发明名称
摘要 An electroplating device for partial plating of items in continuous transit through a plating bath. The bath includes an enclosure having slots for movement of the articles to be plated lengthwise of the bath. A cross flow of treatment liquid is maintained in the constant level bath through the provision of flow directing vanes, the flow being provided by a treatment liquid circulation pump.
申请公布号 DE2460634(B2) 申请公布日期 1979.06.13
申请号 DE19742460634 申请日期 1974.12.20
申请人 SIEMENS AG, 1000 BERLIN UND 8000 MUENCHEN 发明人 DANNEELS, LAURENT, VARSENARE;HELDER, JOHAN;KUYPERS, JAN, DIPL.- CHEM.;PIOLON, JAMES, OSTENDE
分类号 C25D5/02;C25D17/00;(IPC1-7):C25D17/28;C25D17/02 主分类号 C25D5/02
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