| 发明名称 |
Electron beam exposure method |
| 摘要 |
An electron beam having a narrow rectangular cross section, shaped by two aperture plates and a deflector, is scanned over a workpiece or specimen. The length and width of the narrow rectangular cross section, relative to beam scanning, in accordance with the shape of the pattern being exposed.
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| 申请公布号 |
US4151422(A) |
申请公布日期 |
1979.04.24 |
| 申请号 |
US19780913397 |
申请日期 |
1978.06.07 |
| 申请人 |
NIHON DENSHI K K;RIKAGAKU KENKYUSHO |
发明人 |
GOTO, EIICHI;IDESAWA, MASANORI;SOUMA, TAKASHI;YUASA, TETSUO |
| 分类号 |
H01J37/305;H01J37/30;H01J37/302;H01L21/027;(IPC1-7):A61K27/02 |
主分类号 |
H01J37/305 |
| 代理机构 |
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