| 摘要 |
PURPOSE:To obtain a mask aligner featuring the isolating mechanism of a high reproducibility by jetting the air between the mask holder and the wafer chuck mechanism. CONSTITUTION:Holder 5 to which mask 8 is adsorbed is fixed on support 4, and wafer 9 coated with resist is fixed on wafer chuck mechanism 10. The air is jetted through hole 15 to push up collar 11, and chuck 10 is raised up to secure adhesion between the wafer and the mask. At the same time, the air is jetted to collar 11 through hole 17 to keep the slit about 20 m. The floated chuck 10 is controlled via screw 13 while being observed through microscope 19 to match the mask with the wafer, and then the mask is adhered to the wafer with stoppage of jetting through hole 17. Thus, the gap between the wafer and the mask is adjusted by the air pressure in an accurate way with a high reproducubility, ensuring a simple constitution as well as easy maintenance and control. |
