发明名称 |
Beam defining system in an electron accelerator |
摘要 |
A beam defining system for an electron accelerator has an adjustable collimator with an accessory holder attached thereto for retaining an electron applicator. The electron applicator has an applicator wall which encloses an electron beam cone from the collimator. A frame-shaped spacer which can be brought into contact with the patient is attached to the applicator wall. A frame-shaped limiting aperture additional to limiting members in the collimator are provided on the applicator wall in order to limit the electron-beam cone at marginal regions facing away from the beam defining system.
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申请公布号 |
US4140129(A) |
申请公布日期 |
1979.02.20 |
申请号 |
US19770787310 |
申请日期 |
1977.04.13 |
申请人 |
APPLIED RADIATION CORPORATION |
发明人 |
HEINZ, LOTHAR;TAUMANN, LEONHARD |
分类号 |
A61B6/06;A61N5/10;G21K1/02;G21K1/04;G21K5/04;(IPC1-7):A61N1/00 |
主分类号 |
A61B6/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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