摘要 |
PURPOSE:To prevent the local erosion of a target by regulating the distance of the parallel spacing from the respective surfaces of an annular permanent magnet and a central permanent magnet to the surface of a target so as to levelly enlarge the region where the vertical parts of magnetic flux density come close to zero on a target. CONSTITUTION:A magnetron 18 consisting of an annular permanent magnet 12, a permanent magnet 14 located in the center of the above magnet 12, and a yoke supporting both permanent magnets 12, 14 is disposed in a vacuum tank. The distance of the parallel spacing H from the respective surfaces of both these permanent magnets 12, 14 to the target 22 surface is set up to the range of magnet diameter (D)X0.30-0.02. By the above spacing regulation, the range where the vertical components of magnetic flux density in the magnetic field generated from the magnetron 18 come as close as possible to zero on the target 22 is enlarged. As a result, the target 22 can be eroded over the wide range at the time of sputtering.
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