发明名称 |
Integrated single transistor storage element - has strip-shaped zone leading to capacitor electrode and uses two reference voltages, one applied to capacitor and other to diffusion zone |
摘要 |
<p>The storage element has a selector MISFET and a MIS storage element on a doped SC layer. The storage capacitor electrode to which the signal voltage to be stored is applied, is connected to the FET doped drain zone. This electrode consists of a first conducting layer on top of a first insulating layer covering the SC layer surface. A strip-shaped zone doped in opposite sense to the SC layer is embedded in it, and a first reference potential is applied to it. It leads to the opposite electrode of the storage capacitor on the SC layer surface. A second conducting layer (13) is provided on a further insulating layer (12) covering the first conducting layer (7). It forms the capacitor (7, 8, 13) second electrode to which a second reference voltage (UB2) is applied.</p> |
申请公布号 |
DE2728927(A1) |
申请公布日期 |
1979.01.18 |
申请号 |
DE19772728927 |
申请日期 |
1977.06.27 |
申请人 |
SIEMENS AG |
发明人 |
MEUSBURGER,GUENTHER,DIPL.-ING.;HORNINGER,KARLHEINRICH,DR.-ING. |
分类号 |
G11C11/35;G11C11/404;H01L27/108;(IPC1-7):G11C11/40;H01L29/70 |
主分类号 |
G11C11/35 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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