| 摘要 |
PROBLEM TO BE SOLVED: To realize an electron beam equipment having high reliability which deters degradation of a image by converging an electron orbit of the electron emitted from an electron emission element by making an electric field near an electron beam irradiation area into a convex shape, and by suitably adjusting the irradiation position of the electron near the spacers, even when support components (spacer) are prepared. SOLUTION: In the image formation equipment in which a rear plate 1015 and a face plate 1017 are held and fixed at predetermined interval with the spacers 1020, phosphor 2203 and transparent films 2201 are formed in convex sections 2202 projecting toward each cold cathode element 1012 at the positions facing to each cold cathode element 1012.
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