发明名称 ELEKTRISCHER SCHICHTWIDERSTAND UND VERFAHREN ZU SEINER HERSTELLUNG
摘要 Thin film electrical resistors comprised of a substantially homogeneous amorphous chromium-silicon-oxygen alloy having an empirical formula of CrxSiyOz wherein X is a number in the range of about 0.3 to 0.39, y is a number in the range of about 0.4 to 0.52 and x is a number in the range of about 0.1 to 0.30, with the proviso that some of x, y and z is equal to 1. Such resistors exhibit a relatively high ohmic resistance in the range of about 2,000 to 16,000 mu OMEGA xcm.
申请公布号 DE2724498(A1) 申请公布日期 1978.12.14
申请号 DE19772724498 申请日期 1977.05.31
申请人 SIEMENS AG 发明人 HIEBER,KONRAD,DR.RER.NAT.
分类号 B41J2/335;H01C7/00;H01C17/08;H01C17/12;(IPC1-7):01C7/00;01C17/06 主分类号 B41J2/335
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