PLASMA PROCESS APPARATUS HAVING LIFT PIN WITH WEIGHT DETECTING FUNCTION

摘要

PURPOSE: A plasma process apparatus having a lift pin with a weight detecting function is provided to recognize the weight value of a wafer and display an abnormal state when the recognized weight value is higher or lower than a reference value by installing a weight detecting unit capable of detecting the weight of a wafer in the upper portion of a plurality of lift pins. CONSTITUTION: A closed chamber has predetermined volume. A wafer stage on which the wafer is settled is installed in the lower portion of the chamber. A lift plate is installed in the lower portion of the wafer stage, capable of moving up/down. The plurality of lift pins(31) move up/down the substrate(23), connected to the lift plate. The weight detecting unit(33) detects the weight of the substrate, installed in the upper portion of the lift pin.