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发明名称
METHOD FOR FORMING METAL CONTACT IN SEMICONDUCTOR DEVICE
摘要
申请公布号
KR100570059(B1)
申请公布日期
2006.04.10
申请号
KR20030091100
申请日期
2003.12.15
申请人
发明人
分类号
H01L21/28;H01L21/02;H01L21/768;H01L21/8242;H01L27/108
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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