Method for automatic adjustment

摘要

A method for adjusting the registry of a mask in relation to a substrate in a projection printing photolithographic device characterized by after obtaining the adjustment of the registry, correcting the focus of the objective of the device so that the desired surface of the substrate lies in a plane of focus of the objective. The adjusting of the focus is accomplished by displacing the objective or imaging lenses in a direction vertical to the plane of the mask and the surface of the substrate in such a manner that there results an optimum focusing of the light utilized during the adjustment process of the mask to the surface of the substrate.