| 摘要 |
The present invention relates to a bake unit, a substrate treatment device including the same and a substrate treatment method. According to an embodiment of the present invention, the bake unit comprises: a chamber; a heating unit located in the chamber and configured to heat a substrate; a transfer unit located in the chamber and configured to transfer the substrate; and a cooling unit provided for the transfer unit and configured to cool the substrate. Therefore, efficiency in a bake process can be improved. |
