| 发明名称 |
PHOTOSENSITIVE ELASTOMER COMPOSITION |
| 摘要 |
<p>A novel photosensitive elastomeric composition comprising a thermoplastic elastomeric block copolymer, an ethylenically unsaturated compound derived from fumaric acid or maleic acid and a photopolymerization initiator. The composition of the present invention is excellent in various properties, especially in heat stability. The composition of the present invention is useful, especially for the manufacture of flexographic printing elements.</p> |
| 申请公布号 |
JPS53127004(A) |
申请公布日期 |
1978.11.06 |
| 申请号 |
JP19770041251 |
申请日期 |
1977.04.11 |
| 申请人 |
ASAHI CHEMICAL IND |
发明人 |
NAKAMURA SHIYOUHEI;MOROTOMI KENICHI |
| 分类号 |
C08K5/00;C08F2/00;C08F2/48;C08F2/50;C08F285/00;C08F291/00;C08K5/10;C08L23/00;C08L51/00;C08L51/02;C08L53/00;C08L77/00;C08L101/00;C09D4/06;G03F7/033;G03F7/038 |
主分类号 |
C08K5/00 |
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