| 发明名称 |
RADIATION SENSITIVE RESIST COMPOSITION |
| 摘要 |
PURPOSE:To enable a positive type radiation sensitive material to form a required pattern with a sensitivity higher than conventional positive type radiation sensitive polymer material, by using a specified Werner type chromium complex. |
| 申请公布号 |
JPS53125023(A) |
申请公布日期 |
1978.11.01 |
| 申请号 |
JP19770039551 |
申请日期 |
1977.04.08 |
| 申请人 |
TOKYO SHIBAURA ELECTRIC CO |
发明人 |
MATSUMOTO SHIYOUICHI;MIYAMURA MASATAKA |
| 分类号 |
H01L21/027;G03F7/039;H01L21/302;H05K3/06 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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