| 发明名称 |
PRODUCTION OF PHOTO MASK |
| 摘要 |
PURPOSE:To prevent peeling of photosensitive film on wafer by using a radiation sensitive photo resist of positive type such as polychlorinated hydrocarbon, etc. as a sensisitive film and making a photo mask having surface inactive fine patterns. |
| 申请公布号 |
JPS53120374(A) |
申请公布日期 |
1978.10.20 |
| 申请号 |
JP19770035710 |
申请日期 |
1977.03.30 |
| 申请人 |
TOKYO SHIBAURA ELECTRIC CO |
发明人 |
JINNO KIYOKATSU;MATSUMOTO YASUO |
| 分类号 |
G03F1/00;G03F1/68;G03F1/80;H01L21/027;H01L21/302 |
主分类号 |
G03F1/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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