| 发明名称 |
LASER MACHINING APPARATUS FOR CORRECTION OF PHOTO MASKS |
| 摘要 |
PURPOSE:To correct the residual defects of a mask by using laser light of a wavelength differing from that of probe light while distinctly observing the patterns of the photo mask and the slit image by probe light. |
| 申请公布号 |
JPS53120377(A) |
申请公布日期 |
1978.10.20 |
| 申请号 |
JP19770036433 |
申请日期 |
1977.03.30 |
| 申请人 |
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发明人 |
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| 分类号 |
B23K26/00;B23K26/38;G03F1/84;H01L21/027;H01L21/66 |
主分类号 |
B23K26/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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