发明名称 |
Semiconductor esp. FET device mfr. - forms electrostatic screening layer of conducting material between inorganic insulating layer and organic encapsulation material layer |
摘要 |
<p>The semiconductor device is manufactured from a mono-crystalline semiconductor material whose surface is coated with a layer of an inorganic insulating material. The electrode applied to the surface affects the device capacitively. The shell of the device is made from an insulating organic plastic. There is a protective layer (12) which screens the semiconductor substrate (1) electrostatically from the outer shell. This is a conducting layer and is applied before mounting the outer shell (13). The conducting layer is linked to an external terminal which during operation is held at a fixed potential.</p> |
申请公布号 |
DE2713936(A1) |
申请公布日期 |
1978.10.12 |
申请号 |
DE19772713936 |
申请日期 |
1977.03.29 |
申请人 |
SIEMENS AG |
发明人 |
FISCHER,FRANZ,DR.-ING.DR.RER.POL.;FREITAG,THEODOR,DIPL.-PHYS. |
分类号 |
H01L21/56;H01L23/31;H01L23/60;(IPC1-7):H01L21/314 |
主分类号 |
H01L21/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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