发明名称 Semiconductor esp. FET device mfr. - forms electrostatic screening layer of conducting material between inorganic insulating layer and organic encapsulation material layer
摘要 <p>The semiconductor device is manufactured from a mono-crystalline semiconductor material whose surface is coated with a layer of an inorganic insulating material. The electrode applied to the surface affects the device capacitively. The shell of the device is made from an insulating organic plastic. There is a protective layer (12) which screens the semiconductor substrate (1) electrostatically from the outer shell. This is a conducting layer and is applied before mounting the outer shell (13). The conducting layer is linked to an external terminal which during operation is held at a fixed potential.</p>
申请公布号 DE2713936(A1) 申请公布日期 1978.10.12
申请号 DE19772713936 申请日期 1977.03.29
申请人 SIEMENS AG 发明人 FISCHER,FRANZ,DR.-ING.DR.RER.POL.;FREITAG,THEODOR,DIPL.-PHYS.
分类号 H01L21/56;H01L23/31;H01L23/60;(IPC1-7):H01L21/314 主分类号 H01L21/56
代理机构 代理人
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