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发明名称
PLASMA PROCESSING METHOD AND ITS UNIT
摘要
申请公布号
JPS53116076(A)
申请公布日期
1978.10.11
申请号
JP19770030313
申请日期
1977.03.22
申请人
HITACHI LTD
发明人
NISHIDA SUMIO;NAGASHIMA NAOYUKI;ENARI HIDEO
分类号
H01L21/302;H01L21/3065
主分类号
H01L21/302
代理机构
代理人
主权项
地址
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