发明名称 METHOD OF ALIGNING EDGES OF EMITTER AND ITS METALIZATION IN A SEMICONDUCTOR DEVICE
摘要 <p>In making a thyristor, the outer face of the N-type emitter layer and an adjoining surface of the P-type base layer of a semiconductor wafer are metalized, a limited zone of metal overlapping the edge of the emitter-base junction is removed, and then the entire portion of the emitter layer exposed by the removed metal is etched away.</p>
申请公布号 CA1037613(A) 申请公布日期 1978.08.29
申请号 CA19750228434 申请日期 1975.06.02
申请人 GENERAL ELECTRIC COMPANY 发明人 DECECCO, ANGELO L.;HYSELL, ROBERT E.;PICCONE, DANTE E.
分类号 H01L21/00;H01L21/28;H01L29/00;(IPC1-7):01L21/283;01L29/74 主分类号 H01L21/00
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