发明名称 FORMING METHOD FOR RESIST PATTERN
摘要 PURPOSE:To efficiently form a resist pattern on a substrate such as an original plate having a large area by so solid printing the board as to include the pattern with positive resist agent with a safety light. CONSTITUTION:Positive resist agent is applied on a substrate 1 so solid pattern- printed with safety light without curing the agent as to cover all an accurate part B and rough part C of a pattern. After drying, a pattern B necessary for fine and high accuracy is written by using, for example, a photo plotter or an electronic beam exposure unit based on a register mark 2 obtained by printing. Thereafter, it is developed to obtain a resist pattern A covered with the agent on the parts B and C. Thus, a predetermined resist pattern A can be formed on the substrate 1 having a large area efficiently.
申请公布号 JPH02246394(A) 申请公布日期 1990.10.02
申请号 JP19890068744 申请日期 1989.03.20
申请人 TOPPAN PRINTING CO LTD 发明人 TABAYASHI SEIICHI
分类号 G03F7/00;H01L21/027;H05K3/00;H05K3/06 主分类号 G03F7/00
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