发明名称 High power semiconductor diode
摘要 A semiconductor diode consists of a low resistivity n conductivity type semiconductor substrate, a high resistivity n conductivity type semiconductor layer, formed on the surface of the substrate, a high resistivity p conductivity type semiconductor layer, whose thickness is smaller than the diffusion length of electrons, formed on the n conductivity type layer, a metal electrode forming a Schottky barrier contact with the p conductivity type layer, and an electrode forming an ohmic contact with the substrate.
申请公布号 US4089020(A) 申请公布日期 1978.05.09
申请号 US19760677807 申请日期 1976.04.16
申请人 HITACHI, LTD. 发明人 IKEDA, TAKAHIDE;ISHIKAWA, MICHIO
分类号 H01L21/265;H01L29/47;H01L29/861;H01L29/872;(IPC1-7):H01L29/48;H01L29/56;H01L29/64 主分类号 H01L21/265
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