METHODS OF MANUFACTURING MICROCHANNEL PLATES

摘要

1457716 Electron multipliers; image iritensifiers; electrode processing LABORATOIRES D'ELECTRONIQUE ET DE PHYSIQUE APPLIQUEE LEP 20 June 1975 [3 July 1974] 26318/75 Heading H1D A method of manufacturing a secondary emissive microchannel plate includes the step of rounding the input ends of the channel walls with an energy carrying beam (e.g. electron beam or CO 2 laser). Increased electron capture and emission processes are discussed for the rounded structures produced. The beam power may be 100 to 200 W/cm.2. Prior to bombardment, a glass plate may be heated to a temperature near to but lower than the softening temperature, for example by a defocussed beam or a furnace. A Pierce type electron gun with focussing and deflecting coils may be used, (Fig. 3, not shown), in a 10-5 to 10-6 mm. Hg vacuum. Dimensions, temperatures and times are specified. Subsequent cooling is slow to avoid thermal stresses. The plate may be incorporated in an image intensifier or particle detector also including a photocathode and luminescent screen. U.v., X-,γ-, and particle radiation such asα-particles and ions is instanced.