发明名称 Method for producing an InSb thin film
摘要 A method for producing a unique InSb thin film element which comprises the steps of forming a thin film of InSb polycrystal on a substrate of insulating material, forming an oxide film on the InSb thin film, zone-melting the InSb thin film by heating the thin film covered with the oxide film to a temperature above the melting point of InSb in a controlled gaseous heat-treating atmosphere comprising an inert gas containing from 1 ppm to 3 x 104 ppm of oxygen, which is replaceable by an addition of a tenfold amount of aqueous vapor to the extent of 102ppm of oxygen, and cooling the resultant element. An InSb thin film element produced in this way is suitable as a material for a magnetosensitive element of good performance, especially a low noise level or a high S/N ratio.
申请公布号 US4080478(A) 申请公布日期 1978.03.21
申请号 US19750603529 申请日期 1975.08.11
申请人 HITACHI, LTD. 发明人 YAMAMOTO, NAOKI;OI, TETSU;SATO, KIKUJI
分类号 H01L43/12;C30B13/00;C30B19/00;H01F10/187;H01F41/14;H01L43/14;(IPC1-7):H01F10/02 主分类号 H01L43/12
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