| 摘要 |
PURPOSE:To detect the position deviation of a resist film even in the case where a main body element whose position deviation allowance is smaller than margin is present, by arranging a window coinciding with the ion implantation region of a monitor element, in a resist film used as an ion implantation mask for the main body element. CONSTITUTION:For a substrate 1 forming a main body element, the ion implantation region of a monitor element is defined by a film on the substrate 1. A window 6a coinciding with the ion implantation region of a monitor element is arranged in a resist film 5, and ion is implanted, thereby forming the monitor element. After that, electric characteristics of the monitor element are measured, thereby detecting the position deviation of the resist film 5. That is, the ion implantation region is masked by the amount of position deviation of the resist film 5, and the diffusion region formed by ion implantation is narrowed by that amount, so that the position deviation of the resist film can be detected by making the monitor element reflect the narrowing of the diffusion region on the characteristics. |
