| 摘要 |
PURPOSE:To continue analysis while the shift of an analytical position is confirmed to be corrected and to analyze the very small part on the surface of a sample with high accuracy by setting a place to be analyzed and the projection of at least one place formed in the vicinity thereof to marks. CONSTITUTION:The microscopic image in the vicinity of a desired place 2 to be analyzed is observed before analysis and the relative positional relation between the place 2 to be analyzed and a mark 4 is recorded. Next, analysis is started and temporarily interrupted on the way to observe a microscope and it is judged whether the positional shift of the place to be analyzed is generated by comparing the relative positional relation between the projections at three points displayed on an image and an actual analytical position with that before analysis. By this method, when shift is generated in the relative positional relation between a sample and a charged particle beam during analysis, said shift can be determined. Therefore, by again performing analysis after the shift between the mark 4 and the analytical position is corrected before the shift of the analytical position becomes excessive, a very small part can be performed with good analytical position accuracy. |
