| 摘要 |
PROBLEM TO BE SOLVED: To effectively reduce a superposition error even in the case where a dislocation amount at one measuring point among a plurality of measuring points is prominently large by measuring superposition dislocation amounts at a plurality of measuring points and by using 1/2 of the sum of the maximum value and the minimum value as a correction value for an exposure apparatus. SOLUTION: A superposition dislocation amount between a first layer pattern and a second resist pattern is measured at four points by using a first and a second superposition dislocation inspection marks (S10). In the case where at least any of absolute values of respective dislocation amounts is not less than a predetermined value (S11), a correction value is calculated (S13), and a resist is removed and a second resist is formed again (S14). As the correction value, 1/2 of the sum of the maximum value and the minimum value of the dislocation values at the four points is obtained, and this value is fed back to a second exposure (S8). In case where different exposure apparatuses are used for the first and the second layer, even if a dislocation amount of a in the X-direction exists only at the upper right corner of the shot, the dislocation amount of the second exposure is reduced to 0, and the maximum absolute value thereof is reduced to a/2, according to the correction value a/2. |
