| 摘要 |
<p>Electrophotographic prod. is produced by sputtering a crystalline pref. CdS layer onto a pref. Mylar (RTM) substrate accommodated on an anode in a chamber. A plasma is formed between a supply of the material to be applied and the anode, and two dark spaces exist between the plasma and the anode. Sputtering is continued until a crystalline layer has been applied. Pref. the second dark space is formed while sputtering with a high-frequency field with a dc. bias. The anode may be cooled or heated, and is earthed. H2S is pref. fed into the chamber during sputtering.</p> |
