| 发明名称 |
MASK EXPOSURE METHOD OF SEMICONDUCTOR WAFERS |
| 摘要 |
PURPOSE:To perform exposure of contactless mask of processing and forming the main surface to be processed lower than its circumferential part. |
| 申请公布号 |
JPS52136575(A) |
申请公布日期 |
1977.11.15 |
| 申请号 |
JP19760052788 |
申请日期 |
1976.05.11 |
| 申请人 |
TOKYO SHIBAURA ELECTRIC CO |
发明人 |
KUDOU MASAHIDE |
| 分类号 |
G03F7/20;H01L21/027;H01L21/302 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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