发明名称 PREPARATION OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To provide a plurality of patterns for photo-etching in one photomask to perform precisely the alignment of the patterns, whereby the manufacturing yield and reliability of a semiconductor device of minute dimensions are improved.
申请公布号 JPS52125278(A) 申请公布日期 1977.10.20
申请号 JP19760042135 申请日期 1976.04.14
申请人 NIPPON ELECTRIC CO 发明人 YOSHIKAWA KAZUHIKO
分类号 H01L29/73;H01L21/027;H01L21/302;H01L21/331;H01L29/08 主分类号 H01L29/73
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