XXRAY EXPOSURE MASK,申请号JP19760028829-传众专利搜索

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发明名称	XXRAY EXPOSURE MASK
摘要	<p>PURPOSE:To secure an easy position matching through variation of detector output signal by constituting X-ray detector through formation of pn-junction region of prescribed pattern at the prescribed area of semiconductor wafer.</p>
申请公布号	JPS52112280(A)	申请公布日期	1977.09.20
申请号	JP19760028829	申请日期	1976.03.17
申请人	MITSUBISHI ELECTRIC CORP	发明人	MATSUKAWA TAKAYUKI;KOYAMA HIROSHI;KATOU TADAO;KAWAZU SATORU
分类号	H01L21/027;H01L21/302	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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