| 发明名称 |
Apparatus for producing a controlled radial path of resistance in a semiconductor monocrystalline rod |
| 摘要 |
An apparatus for controlling a radial path of resistance in a semiconductor monocrystalline rod produced by a crucible-free zone melting whereby the material flow path and heat distribution in the melt zone is controlled by a guided stream of protective gas.
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| 申请公布号 |
US4039283(A) |
申请公布日期 |
1977.08.02 |
| 申请号 |
US19750606854 |
申请日期 |
1975.08.22 |
| 申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
KELLER, WOLFGANG |
| 分类号 |
C30B13/28;(IPC1-7):B01J17/10 |
主分类号 |
C30B13/28 |
| 代理机构 |
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