MASK STRUCTURE FOR X-RAY LITHOGRAPHY

摘要

A mask structure for use in an x-ray lithographic system comprises as the substrate thereof a Mylar film stretched over and bonded to a support ring. The stretched Mylar film exhibits an attractive combination of advantageous properties such as high planarity, dimensional stability, mechanical strength, low x-ray absorption, resistance to organic solvents, optical transparency, and ready availability in a variety of thicknesses with optical quality surfaces.