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发明名称
CONTINUOUS SPUTTERING APPARATUS
摘要
PURPOSE:Continuous sputtering apparatus, equipping target electrode moving mechanism. able to operate at outside of cell, in order to form thin coating of metal or insulating material on the surface of base plate.
申请公布号
JPS5259078(A)
申请公布日期
1977.05.16
申请号
JP19750136005
申请日期
1975.11.11
申请人
NIPPON ELECTRIC CO
发明人
HIRAGA TAIJI
分类号
C23C14/56;C23C14/34;H01J37/34
主分类号
C23C14/56
代理机构
代理人
主权项
地址
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