发明名称 |
Method and apparatus for making a metal to semiconductor contact |
摘要 |
A method and apparatus for making a reproducible, pressure and surface constant metal to semiconductor contact for voltage capacitance measurements on semiconductor samples with mercury as the metal component, wherein the mercury is pressed through a contact tubule having a constant diameter against a semiconductor surface by means of a movable pressure piston under a reproducible constant pressure from a supply vessel.
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申请公布号 |
US4021735(A) |
申请公布日期 |
1977.05.03 |
申请号 |
US19750624797 |
申请日期 |
1975.10.22 |
申请人 |
WACKER-CHEMITRONIC GESELLSCHAFT FUR ELEKTRONIK GRUNDSTOFFE MBH |
发明人 |
VIEWEG-GUTBERLET, FRITZ;SIEGESLEITNER, PETER |
分类号 |
G01R27/02;G01R31/26;H01H1/00;H01L21/66;(IPC1-7):G01R1/06;G01R27/26 |
主分类号 |
G01R27/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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