发明名称 Method and apparatus for making a metal to semiconductor contact
摘要 A method and apparatus for making a reproducible, pressure and surface constant metal to semiconductor contact for voltage capacitance measurements on semiconductor samples with mercury as the metal component, wherein the mercury is pressed through a contact tubule having a constant diameter against a semiconductor surface by means of a movable pressure piston under a reproducible constant pressure from a supply vessel.
申请公布号 US4021735(A) 申请公布日期 1977.05.03
申请号 US19750624797 申请日期 1975.10.22
申请人 WACKER-CHEMITRONIC GESELLSCHAFT FUR ELEKTRONIK GRUNDSTOFFE MBH 发明人 VIEWEG-GUTBERLET, FRITZ;SIEGESLEITNER, PETER
分类号 G01R27/02;G01R31/26;H01H1/00;H01L21/66;(IPC1-7):G01R1/06;G01R27/26 主分类号 G01R27/02
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