Method for providing porous broad-band antireflective surface layers on chemically-durable borosilicate glasses

摘要

A method for providing broad-band antireflective surface layers on a chemically durable borosilicate glass which comprises phase-separating the glass by heat treatment at 630 DEG -660 DEG C., removing a siliceous surface layer from the glass, and treating the glass in an aqueous solution containing both H<+> ions and F<-> ions for a time sufficient to produce the antireflective surface layer, is described. Antireflective surface layers exhibiting reflectances as low as 0.5% throughout the wavelength range from about 0.4-2.0 microns have been produced.