发明名称 Sample analysis apparatus using electron beam irradiation
摘要 In a sample analysis apparatus, a sample to be analyzed is irradiated by the electron beam from an electron gun, and the information obtained from the sample and characteristic of the sample is detected for the analysis of the sample. The electron gun and the sample are placed respectively in an electron gun chamber and in a sample chamber. An intermediate chamber is located between the electron gun chamber and the sample chamber. That portion of the sample chamber which contains the sample is protuberant into the intermediate chamber. The intermediate chamber is evacuated to a degree of vacuum higher than the sample chamber but lower than the electron gun chamber.
申请公布号 US4020353(A) 申请公布日期 1977.04.26
申请号 US19750609943 申请日期 1975.09.03
申请人 HITACHI, LTD. 发明人 SAITO, SYOBU;SAKITANI, YOSHIO
分类号 H01J37/18;H01J37/20;(IPC1-7):H01J37/06 主分类号 H01J37/18
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