| 摘要 |
PURPOSE:To simplify a process in which the surface of a light reflecting plane is formed rugged by a method wherein a light reflecting layer is formed of silver through a sputtering method at a prescribed temperature and prevented from being exposed to atmosphere thereafter, and a transparent conductive layer of zinc oxide is formed on the light reflecting layer concerned through a sputtering method under such a conduction that a puttering temperature and a sputtering time are specified. CONSTITUTION:Silver is used as a material of a light reflecting layer, and the light reflecting layer is formed through a sputtering method using a target of silver at a temperature of 50-240 deg.C, and a transparent conductive layer of zinc oxide is formed on the light reflecting layer through a sputtering method at a temperature of 250-350 deg.C. At this point, a substrate is kept at the prescribed temperature for 40 minutes or more at the formation of the transparent conductive layer. That is, a silver thin film and a zinc oxide layer are successively formed on a stainless steel substrate 0.5mm in thickness, whose surface is flattened by mirror polishing, in an atmosphere of Ar through a well-known sputtering method as changing the substrate temperature without breaking vacuum. |
