| 摘要 |
<p>Source of heavy ions, especially UO2 ions, comprising in a vacuum chamber (a) a soruce of primary ions (b) a charge exchange casing the inelt of which is supplied from the primary ion source and the outlet of which delivers an at least partly neutralised molecular or primary atomic jet, and (c) a target of material to be ionised intercepting the primary jet coming from the charge exchange casign and being located in an enclosure brought ot a potential of opposite sign to that of the ions produced. The use of a neutral or partly neutralised molecular- or atomic-jet permits suppression of the space charge arising when a target is bombarded with an ion beam such as that used in conventional cathode spraying processes which prevents the primary beam of striking the target with sufficiently great flux, and causes a decrease in secondary emission of heavy ions from the target.</p> |
