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经营范围
发明名称
PRODUCTION METHOD OF SEMICONDUCTOR DEVICE
摘要
PURPOSE:In order to perform the accurate position adjustment with the mask, by means of attaching a microscopic mark on the surface to be treated through using a radiation source.
申请公布号
JPS5218176(A)
申请公布日期
1977.02.10
申请号
JP19750093875
申请日期
1975.08.01
申请人
FUJITSU LTD
发明人
OZAKI EIJI
分类号
H01L21/027;H01L21/302
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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