发明名称 METHOD OF MAKING PLATE FOR LITHOGRAPHIC PRINTING AND POST-EXPOSING APPARATUS FOR PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 PROBLEM TO BE SOLVED: To provide a method and an apparatus for suppressing a rise in the temperature of lithographic printing caused by heat generation of a light source in a post-exposure as an effective means in a CTP system. SOLUTION: In the method of manufacturing lithographic printing plate, photo-polymerizable and photosensitive lithographic printing plate including (a) a compound having an ethylenic unsaturated bond of being addition- polymerizable, and (b) a photo-polymerizable and photosensitive layer containing a series of agents for starting photo-polymerization, is exposed with a laser light to form image, and then developed, and furthermore, post-exposed, a means to suppress a rise in the temperature of the photo-polymerizable and photosensitive lithographic printing plate is used when post-exposed.
申请公布号 JP2002162753(A) 申请公布日期 2002.06.07
申请号 JP20000360745 申请日期 2000.11.28
申请人 MITSUBISHI CHEMICALS CORP 发明人 TOSHIMITSU ERIKO;OKAMOTO HIDEAKI
分类号 G03F7/40;G03F7/00;G03F7/20;(IPC1-7):G03F7/40 主分类号 G03F7/40
代理机构 代理人
主权项
地址