发明名称 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an immersion apparatus having an effective means for removing an immersion liquid from a surface. <P>SOLUTION: A gas knife configured to dry the surface in an immersion lithographic apparatus is optimized to remove the liquid by ensuring that a pressure gradient is built up in a liquid film on the surface being dried. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010021568(A) 申请公布日期 2010.01.28
申请号 JP20090230362 申请日期 2009.10.02
申请人 ASML NETHERLANDS BV 发明人 KEMPER NICOLAAS R;LAMBERTUS DONDERS SJOERD NICOLAAS;HOOGENDAM CHRISTIAAN ALEXANDER;TEN KATE NICOLAAS;SERGEI SHULEPOV
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址