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发明名称
MANUFACTURE OF SILICON OXIDE FILM FOR SEMICONDUCTOR DEVICE
摘要
申请公布号
JPH03225826(A)
申请公布日期
1991.10.04
申请号
JP19900020121
申请日期
1990.01.30
申请人
KOJUNDO CHEM LAB CO LTD
发明人
HOCHIDO YUKO;FUTAKI TAKEHIKO
分类号
H01L21/316
主分类号
H01L21/316
代理机构
代理人
主权项
地址
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