发明名称 Wafer binding method and apparatus
摘要 The present invention relates to a method and an apparatus (1) for automatically binding a silicon wafer (6) to a carrier plate (7). In the binding method of the present invention, the wafer (6) is positioned underneath the carrier plate (7) and then lifted and bonded to the carrier plate (7), at or below atmospheric pressure: once this is accomplished the process returns to the previous pressure. In addition, in the apparatus (1) which performs this process, by means of a carrier means (5) which supplies the carrier plate (7) and wafer (6) to the location where binding is to be carried out, the binding surface of the carrier plate (7) and wafer (6) are turned upward, transported and the carrier plate (7) is flipped around in the interval between the carrier plate transportation apparatus and the binding unit. <IMAGE>
申请公布号 US5254205(A) 申请公布日期 1993.10.19
申请号 US19910800833 申请日期 1991.11.29
申请人 MITSUBISHI MATERIALS CORPORATION;MITSUBISHI MATERIALS SILICON CORPORATION 发明人 TSUTSUMI, YUKIO;MATSUMOTO, TATSUMI;TAKAHASHI, KEISUKE;KOYAMA, MITSUZI
分类号 B23Q3/08;B24B37/04;B24B37/30;H01L21/00;H01L21/304;H01L21/673;H01L21/683;(IPC1-7):B32B31/00 主分类号 B23Q3/08
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