| 摘要 |
PURPOSE:To reduce the cost of an etching soln. for Ni obtained by consisting the same of the specific composition contg. sulfuric acid, aq. hydrogen peroxide, acetic acid, phosphoric acid and benztriazole, and make it possible to maintain its selective etching capacity for a long period of time. CONSTITUTION:This etching soln. for Ni has the composition consisting, by g/l, of 50-150 sulfuric acid, 50-100 aq. hydrogen peroxide, 50-150 acetic acid, 10- 50 phosphoric acid, and 0.5-3 benztriazole. In the case of etching only the Ni selectively out of >=2 kinds of metals including Ni, this etching soln. is unaffected by the purity of Ni, and does not discolor or oxidize the other metals. it maintains the capacity of etching the Ni selectively for a long period of time. |
