发明名称 WAFER PROCESSING METHOD AND WAFER PROCESSING APPARATUS
摘要 A wafer processing method and a wafer processing apparatus are provided to reduce the time required for applying a die attachment paste on a back side of a wafer without using a die attachment film, since the die attachment paste is applied to the entire ground back side of the wafer by a single operation. A wafer processing method comprises the steps of: grinding a back side of a wafer(20) having a circuit pattern(C) on a front side; applying a die attachment paste(24) on the entire ground back side of the wafer; attaching a dicing tape on the applied die attachment paste; and dicing the wafer according to the circuit pattern.
申请公布号 KR20080023666(A) 申请公布日期 2008.03.14
申请号 KR20070092288 申请日期 2007.09.11
申请人 TOKYO SEIMITSU CO., LTD. 发明人 HAYASHI TOMOO
分类号 H01L21/301;H01L21/304;H01L21/52 主分类号 H01L21/301
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