发明名称 PELLICLE FOR SEMICONDUCTOR AND PRODUCTION THEREOF
摘要 PURPOSE:To obtain the pellicle which does not contain a solvent and has good weatherability by forming a film in a film forming atmosphere filled with the same solvent as the solvent of the film forming material at the time of forming the film by a spin coater. CONSTITUTION:A substrate 3 for film formation, such as quartz plate, is superposed on a rotary stage 2 and is housed in a chamber 1. A dropping nozzle 4 for dropping a film forming material soln. prepd. by dissolving the film forming material into the solvent onto the substrate 3 for film formation is provided and after the film forming material soln. is dropped from the dropping nozzle 4 onto the substrate 3 for film formation, a cap 5 is closed and the chamber 1 is internally hermetically sealed. After air is removed from a discharge port 6, gaseous nitrogen is sent from a gas feed port 7 into the chamber and gaseous nitrogen is fed from a gas feed port 8. The solvent housed in a liquid storage tank 9 is evaporated and this solvent is admitted into the chamber. The rotary stage 2 is then rotated to spread the dropping liquid on the substrate 3 and thereafter, the cap 5 is opened and the solvent is evaporated by increasing the rotating speed of the rotary stage 2.
申请公布号 JPH0527414(A) 申请公布日期 1993.02.05
申请号 JP19910206587 申请日期 1991.07.23
申请人 SHIN ETSU CHEM CO LTD 发明人 NAGATA AKIHIKO;NOGUCHI HITOSHI;KASHIDA SHU
分类号 B05D1/40;G03F1/62;H01L21/027 主分类号 B05D1/40
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