发明名称 Method and device for electron beam irradiation of lif monocrystals in order to manufacture passive laser switches with f2 colour centres.
摘要 The invention refers to a method and device for electron beam irradiation of LiF monocrystals in order to manufacture passive laser switches with F2 colour centres, which ensures the uniform irradiation of LiF monocrystals at a 20...30 Mrad/h output of the irradiation dose. At the 1.064 μm wavelength, after irradiation doses of 70...80 Mrad, the absorption factors reach 0.4...0.45 cm-1>. The crystals are prevented from overheating by cooling the air-tight sheath, into which the LiF monocrystals are introduced, with a thermostat-controlled water current at a temperature of 10...15 degrees C. The irradiation time is 2...3 hours.
申请公布号 RO112940(B) 申请公布日期 1998.01.30
申请号 RO19940001564 申请日期 1994.09.23
申请人 FUNDATIA UNIVERSITARA HYPERION, BUCURESTI 发明人 JURBA MIHAI EMIL;BALTATEANU NICOLAE;SPANULESCU ION
分类号 H01S3/113;(IPC1-7):H01S3/113 主分类号 H01S3/113
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