发明名称 |
Method and device for electron beam irradiation of lif monocrystals in order to manufacture passive laser switches with f2 colour centres. |
摘要 |
The invention refers to a method and device for electron beam irradiation of LiF monocrystals in order to manufacture passive laser switches with F2 colour centres, which ensures the uniform irradiation of LiF monocrystals at a 20...30 Mrad/h output of the irradiation dose. At the 1.064 μm wavelength, after irradiation doses of 70...80 Mrad, the absorption factors reach 0.4...0.45 cm-1>. The crystals are prevented from overheating by cooling the air-tight sheath, into which the LiF monocrystals are introduced, with a thermostat-controlled water current at a temperature of 10...15 degrees C. The irradiation time is 2...3 hours.
|
申请公布号 |
RO112940(B) |
申请公布日期 |
1998.01.30 |
申请号 |
RO19940001564 |
申请日期 |
1994.09.23 |
申请人 |
FUNDATIA UNIVERSITARA HYPERION, BUCURESTI |
发明人 |
JURBA MIHAI EMIL;BALTATEANU NICOLAE;SPANULESCU ION |
分类号 |
H01S3/113;(IPC1-7):H01S3/113 |
主分类号 |
H01S3/113 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|