发明名称 PHOTOSENSITIVE COMPOSITION FOR OPTICAL WAVEGUIDE, MANUFACTURING OF THE SAME, AND FORMATION OF HIGH POLYMER OPTICAL WAVEGUIDE PATTERN
摘要 PROBLEM TO BE SOLVED: To form a high polymer optical waveguide pattern capable of being easily massproduced and easily connected to optical parts by having the easy pattern formability, and using a specific organic oligmer superior in heat resistance and moisture resistance, having low double refraction, and superior in workability. SOLUTION: In a photosensitive composition for an optical waveguide, including an organic oligomer and a polymerization starting agent, the organic oligomer is silicone oligomer presented by a formula, and the like. In the formula, X is a hydrogen atom, a heavy hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, (m) is an integer of 1-5, and (x) and (y) are respectively ratio of units, and are not 0. R1 is a methyl group, an ethyl group or an isopropyl group. An epoxy oligomer or an acryl oligomer can be also used as the organic oligomer, besides this silicone oligomer.
申请公布号 JP2000180643(A) 申请公布日期 2000.06.30
申请号 JP19990284886 申请日期 1999.10.05
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 TOYODA SEIJI;IMAMURA SABURO;TOMARU AKIRA;KURIHARA TAKASHI;ENBUTSU KOUJI;HAYASHIDA SHOICHI;MARUNO TORU
分类号 G03F7/075;C08L83/04;G02B6/12;G02B6/13 主分类号 G03F7/075
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